MAT SCI 224

Deposition Technologies and Their Applications

Description: Lecture, four hours; discussion, one hour; outside study, seven hours. Examination of physics behind majority of modern thin film deposition technologies based on vapor phase transport. Basic vacuum technology and gas kinetics. Deposition methods used in high-technology applications. Theory and experimental details of physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition processes. Letter grading.

Units: 4.0
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James Barrie

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Shan Huang

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Tieyi Li

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Ya-hong Xie

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Xinke Yu

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